JPH0479420U - - Google Patents
Info
- Publication number
- JPH0479420U JPH0479420U JP12267590U JP12267590U JPH0479420U JP H0479420 U JPH0479420 U JP H0479420U JP 12267590 U JP12267590 U JP 12267590U JP 12267590 U JP12267590 U JP 12267590U JP H0479420 U JPH0479420 U JP H0479420U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- vapor deposition
- chemical vapor
- electrodes
- opposing electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005229 chemical vapour deposition Methods 0.000 claims 2
- 238000006243 chemical reaction Methods 0.000 claims 1
- 239000010409 thin film Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 230000008016 vaporization Effects 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12267590U JPH0479420U (en]) | 1990-11-22 | 1990-11-22 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12267590U JPH0479420U (en]) | 1990-11-22 | 1990-11-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0479420U true JPH0479420U (en]) | 1992-07-10 |
Family
ID=31870436
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12267590U Pending JPH0479420U (en]) | 1990-11-22 | 1990-11-22 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0479420U (en]) |
-
1990
- 1990-11-22 JP JP12267590U patent/JPH0479420U/ja active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5633839A (en) | Plasma treatment and device therefor | |
JPH0479420U (en]) | ||
JPH0469465U (en]) | ||
JPH0413050U (en]) | ||
JPH07316794A (ja) | イオンプレーティングのプラズマビーム制御方法及び制御装置 | |
JP2586081Y2 (ja) | プラズマ処理装置 | |
JPS6274332U (en]) | ||
JPS5983971U (ja) | イオンプレ−テイング装置 | |
JPS61171129A (ja) | 半導体製造装置 | |
JPH0336721U (en]) | ||
JPH0247030U (en]) | ||
JPH0244326U (en]) | ||
JP2543916Y2 (ja) | アーク式蒸発源用のアーク電源装置 | |
JPS60160030U (ja) | 高周波電源の保護回路 | |
JPS6214724U (en]) | ||
JPH0746262Y2 (ja) | 電極収容放電管を有するオゾン発生美顔器 | |
JPS63115223U (en]) | ||
JPS6346465U (en]) | ||
JP4173759B2 (ja) | アーク蒸発式成膜装置 | |
JPS6255564U (en]) | ||
JPH01142453U (en]) | ||
JPH0254228U (en]) | ||
JPH0183067U (en]) | ||
JPH0322063U (en]) | ||
JPS55110774A (en) | High vacuum ion plating apparatus |